GLASS SUBSTRATE WITH HOLDING PART, HEAT TREATMENT METHOD FOR GLASS SUBSTRATE, AND GLASS SUBSTRATE SUPPORT UNIT

• Main Authors: INAYAMA NAOTOSHI, TERANISHI YASUO, UMEMURA HIROMICHI
• Format: Patent
• Language: English; Japanese
• Published: 30.10.2014
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMISTRY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; GLASS; MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES; METALLURGY; MINERAL OR SLAG WOOL; SEMICONDUCTOR DEVICES

PROBLEM TO BE SOLVED: To provide a glass substrate capable of supporting a glass substrate of a rectangular flat plate shape without adding any unnecessary stress, when the glass substrate is subjected to a heat treatment, and effectively preventing any deformation, strain or flaw in the glass substrate, and to provide a heat treatment method and a glass substrate support unit.SOLUTION: A glass substrate 1 has its marginal part 10a formed with a holding part 11 thicker than the remaining region, and is subjected to a heat treatment while the glass substrate 1 is held through the holding part 11. After the end of the heat treatment, a predetermined area containing the holding part 11 is removed from the glass substrate 1. 【課題】矩形平板状のガラス基板に熱処理を施す際、余計な応力を付加することなくガラス基板を支持することができ、ガラス基板に変形や歪や傷などが発生するのを効果的に防止することが可能なガラス基板、ガラス基板の熱処理方法、及びガラス基板支持ユニットを提供する。【解決手段】ガラス基板１の辺縁部１０ａには、他の領域に比べて板厚の厚い保持部１１を形成し、保持部１１を介してガラス基板１を保持しつつ、ガラス基板１に熱処理を施し、熱処理の終了後、保持部１１を含む所定の領域を、ガラス基板１より欠除する。【選択図】図１