SUBSTRATE LIQUID PROCESSING APPARATUS AND ABNORMAL AIRFLOW DETECTION METHOD

• Main Author: ITO KIKO
• Format: Patent
• Language: English
• Published: 22.09.2014
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

PROBLEM TO BE SOLVED: To detect the occurrence of abnormality in airflow that flows from an upper opening of a liquid receiving cup to the inside of the liquid receiving cup and that flows inside the liquid receiving cup downward to be discharged to a cup discharge path.SOLUTION: A substrate liquid processing apparatus comprises: a substrate holding portion (10) configured to hold and rotate a substrate (W); processing liquid nozzles (51 to 54) configured to supply processing liquid to the substrate; cylindrical liquid receiving cups (20 and 30), having openings on the upper parts, configured to surround the periphery of the substrate and receive and collect processing liquid scattered from the substrate; a housing (60) configured to accommodate the substrate holding portion and the liquid receiving cups; a cup exhaust path (36) connected to the liquid receiving cup to exhaust atmosphere inside the liquid receiving cups; an exhaust path pressure sensor (92) configured to detect pressure in the cup exhaust path; a housing pressure sensor (91) configured to detect pressure in the housing outside the liquid receiving cup; and a control unit (100) configured to alert when a difference between a value (P1) detected by the housing pressure sensor and a value (Pc) detected by the exhaust path pressure sensor is a predetermined reference value or less.