WATER-REPELLENT TREATMENT METHOD OF FINE PATTERN SURFACE

• Main Authors: HAMADE YOHEI, IKEGAME TAKESHI, SAWADA ETSUKO, TSUTSUI AKIRA, MIHARA HIROAKI
• Format: Patent
• Language: English
• Published: 22.09.2014
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL; SPRAYING OR ATOMISING IN GENERAL; TRANSPORTING

PROBLEM TO BE SOLVED: To provide a method for forming a fine pattern having a desired pattern shape and having a surface excellent in water repellency and durability.SOLUTION: A water-repellent treatment method for a fine pattern surface is provided, which includes steps of: preparing a partially hydrolyzed product solution by mixing and stirring a perfluoropolyether group-containing silane-based water repellent, an organic acid, a fluorine-based solvent that can dissolve the perfluoropolyether group-containing silane-based water repellent and the organic acid, and water so as to hydrolyze the perfluoropolyether group-containing silane-based water repellent; forming a photosensitive resin layer on a substrate; applying the partially hydrolyzed product solution on the photosensitive resin layer to form a water-repellent film; patterning the photosensitive resin layer and the water-repellent film by exposure; heating to collectively cure an exposed portion of the photosensitive resin layer and the water-repellent film; and removing an unexposed portion of the photosensitive resin layer and of the water-repellent film by development to form a fine pattern.