METHOD FOR MANUFACTURING MASK BLANK SUBSTRATE, METHOD FOR MANUFACTURING SUBSTRATE WITH MULTILAYER REFLECTION FILM, METHOD FOR MANUFACTURING MASK BLANK, AND METHOD FOR MANUFACTURING TRANSFER MASK
PROBLEM TO BE SOLVED: To provide a method for manufacturing a practical mask blank substrate capable of reducing defects of a 30-nm class.SOLUTION: A mask blank substrate is manufactured by a method comprising the steps of: preparing a mask blank substrate with a polished principal surface and surfa...
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Main Authors | , , , |
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Format | Patent |
Language | English |
Published |
21.08.2014
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Subjects | |
Online Access | Get full text |
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Abstract | PROBLEM TO BE SOLVED: To provide a method for manufacturing a practical mask blank substrate capable of reducing defects of a 30-nm class.SOLUTION: A mask blank substrate is manufactured by a method comprising the steps of: preparing a mask blank substrate with a polished principal surface and surface information including surface form information and position information with respect to the principal surface; detecting a specific portion on the principal surface exceeding a prescribed reference value from the surface form information and identifying the location of the detected specific portion from the position information(specific portion identifying step); and arranging a moving body having a catalyst surface arranged facing the principal surface of the mask blank substrate in the location of the specific portion identified by the specific portion identifying step and locally processing the specific portion by catalyst-referred etching in a state in which a process liquid is interposed between the catalyst surface and the specific portion (local processing step). |
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AbstractList | PROBLEM TO BE SOLVED: To provide a method for manufacturing a practical mask blank substrate capable of reducing defects of a 30-nm class.SOLUTION: A mask blank substrate is manufactured by a method comprising the steps of: preparing a mask blank substrate with a polished principal surface and surface information including surface form information and position information with respect to the principal surface; detecting a specific portion on the principal surface exceeding a prescribed reference value from the surface form information and identifying the location of the detected specific portion from the position information(specific portion identifying step); and arranging a moving body having a catalyst surface arranged facing the principal surface of the mask blank substrate in the location of the specific portion identified by the specific portion identifying step and locally processing the specific portion by catalyst-referred etching in a state in which a process liquid is interposed between the catalyst surface and the specific portion (local processing step). |
Author | YAMADA TAKAYUKI SHOKI TSUTOMU ORIHARA TOSHIHIKO NISHIMURA TAKAHITO |
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Notes | Application Number: JP20130017130 |
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Snippet | PROBLEM TO BE SOLVED: To provide a method for manufacturing a practical mask blank substrate capable of reducing defects of a 30-nm class.SOLUTION: A mask... |
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SubjectTerms | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMISTRY CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY GLASS HOLOGRAPHY JOINING GLASS TO GLASS OR OTHER MATERIALS MATERIALS THEREFOR METALLURGY MINERAL OR SLAG WOOL ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS |
Title | METHOD FOR MANUFACTURING MASK BLANK SUBSTRATE, METHOD FOR MANUFACTURING SUBSTRATE WITH MULTILAYER REFLECTION FILM, METHOD FOR MANUFACTURING MASK BLANK, AND METHOD FOR MANUFACTURING TRANSFER MASK |
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