FOCUSED ION BEAM DEVICE

PROBLEM TO BE SOLVED: To provide a focused ion beam device which shortens a distance between an emitter and a beam limit aperture even when an FIB column is inclined, and obtains a beam performance equal to the case in which the column is not inclined.SOLUTION: A normal line of a surface of holding...

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Bibliographic Details
Main Authors SASAKI MASAJI, KUBO TAKEHIRO, MADOKORO YUICHI
Format Patent
LanguageEnglish
Published 21.08.2014
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
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Summary:PROBLEM TO BE SOLVED: To provide a focused ion beam device which shortens a distance between an emitter and a beam limit aperture even when an FIB column is inclined, and obtains a beam performance equal to the case in which the column is not inclined.SOLUTION: A normal line of a surface of holding a liquid metal 110 in a beam limit aperture is inclined with respect to the straight line formed by the hole center of an extraction electrode 201 of a liquid metal ion gun and the aperture hole center of the beam limit aperture (a base 111). Even when a central shaft of a focused ion beam device is inclined from a shaft 115 in a vertical direction (an angle ), liquid dripping, hole clogging and the like in the beam limit aperture holding the liquid metal can be avoided and thereby the emission can be stabilized. Moreover, the distance between an emitter 101 of a liquid metal ion source and the beam limit aperture can be shortened in the inclined focused ion beam device, and thereby even a large current beam can be narrowed.
Bibliography:Application Number: JP20130016331