ELECTRON BEAM LITHOGRAPHY APPARATUS

• Main Author: NARITA EISUKE
• Format: Patent
• Language: English
• Published: 07.08.2014
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

PROBLEM TO BE SOLVED: To solve such a problem that unintended irradiation with reflection electrons or secondary electrons cannot be prevented completely, in the improvement of an electron beam lithography apparatus including an antireflection mechanism for preventing the long-distance photosensitiv...