PROJECTION EXPOSURE APPARATUS COMPRISING ACTUATOR SYSTEM

PROBLEM TO BE SOLVED: To disclose a projection exposure apparatus for semiconductor lithography indicating improvement of heat management.SOLUTION: A projection exposure apparatus for semiconductor lithography comprises a projection objective lens. The projection objective lens includes a projection...

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Bibliographic Details
Main Authors MARTIN MAHLMANN, SIGEL BENJAMIN, ANDREAS BERTELE, PETER KLOESCH, WEBER JOCHEN
Format Patent
LanguageEnglish
Published 26.06.2014
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
SEMICONDUCTOR DEVICES
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