PROJECTION EXPOSURE APPARATUS COMPRISING ACTUATOR SYSTEM

PROBLEM TO BE SOLVED: To disclose a projection exposure apparatus for semiconductor lithography indicating improvement of heat management.SOLUTION: A projection exposure apparatus for semiconductor lithography comprises a projection objective lens. The projection objective lens includes a projection...

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Bibliographic Details
Main Authors MARTIN MAHLMANN, SIGEL BENJAMIN, ANDREAS BERTELE, PETER KLOESCH, WEBER JOCHEN
Format Patent
LanguageEnglish
Published 26.06.2014
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PROBLEM TO BE SOLVED: To disclose a projection exposure apparatus for semiconductor lithography indicating improvement of heat management.SOLUTION: A projection exposure apparatus for semiconductor lithography comprises a projection objective lens. The projection objective lens includes a projection objective lens housing and an actuator system 1 for mechanical actuation of at least one optical component 7 disposed within the projection objective lens. The actuator system 1 includes at least one of means 60, 6, 2, 4 for reducing heat transfer into at least one optical component 7 caused by heat generated during operation of the actuator system 1. The actuator system includes an attenuation system, the attenuation system comprises a vibration-proof mass body including a damper, and the mass body is disposed outside of the objective lens housing.
Bibliography:Application Number: JP20130267424