HIGH PRESSURE VESSEL, SUBSTRATE PROCESSING APPARATUS, AND MANUFACTURING METHOD OF HIGH PRESSURE VESSEL

• Main Authors: ONO HIROMOTO, TOSHIMA TAKAYUKI, INATOMI HIROAKI, YO HAJIME, MITSUOKA KAZUYUKI, ORII TAKEHIKO
• Format: Patent
• Language: English
• Published: 09.06.2014
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR; PERFORMING OPERATIONS; SEMICONDUCTOR DEVICES; SUCH WORKING COMBINED WITH OTHER FORMS OF WORKING OF METAL; TRANSPORTING; WORKING OF METAL BY THE ACTION OF A HIGH CONCENTRATION OFELECTRIC CURRENT ON A WORKPIECE USING AN ELECTRODE WHICH TAKESTHE PLACE OF A TOOL

PROBLEM TO BE SOLVED: To provide a high pressure vessel etc. capable of forming a processing space achieving high level cleanliness.SOLUTION: In a high pressure vessel, treatment is performed on a substrate by a high pressure fluid. Further, a cavity part is formed by processing performed from one surface of a flat rectangular parallelepiped metal block 5 which is other than a widest area surface, and noble metal plating 7 is formed on an inner wall surface facing the cavity part to form a vessel body. In a case where the cavity part is formed as a through hole, a lid which opens and closes the cavity part is provided at the one side surface of the through hole and a second block which closes the cavity part in an airtight manner is provided on the other side surface.