HIGH PRESSURE VESSEL, SUBSTRATE PROCESSING APPARATUS, AND MANUFACTURING METHOD OF HIGH PRESSURE VESSEL
PROBLEM TO BE SOLVED: To provide a high pressure vessel etc. capable of forming a processing space achieving high level cleanliness.SOLUTION: In a high pressure vessel, treatment is performed on a substrate by a high pressure fluid. Further, a cavity part is formed by processing performed from one s...
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Main Authors | , , , , , |
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Format | Patent |
Language | English |
Published |
09.06.2014
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Subjects | |
Online Access | Get full text |
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Summary: | PROBLEM TO BE SOLVED: To provide a high pressure vessel etc. capable of forming a processing space achieving high level cleanliness.SOLUTION: In a high pressure vessel, treatment is performed on a substrate by a high pressure fluid. Further, a cavity part is formed by processing performed from one surface of a flat rectangular parallelepiped metal block 5 which is other than a widest area surface, and noble metal plating 7 is formed on an inner wall surface facing the cavity part to form a vessel body. In a case where the cavity part is formed as a through hole, a lid which opens and closes the cavity part is provided at the one side surface of the through hole and a second block which closes the cavity part in an airtight manner is provided on the other side surface. |
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Bibliography: | Application Number: JP20120261110 |