PHOTOMETRIC DEVICE

• Main Author: SUZUKI AKITOMO
• Format: Patent
• Language: English
• Published: 19.05.2014
• Subjects: INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES; MEASURING; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; PHYSICS; TESTING

PROBLEM TO BE SOLVED: To provide a photometric device that can be improved in measurement precision by reducing an influence of rear-face reflection even when a rear surface of a sample to be measured tilts to a measured surface of the sample to be measured.SOLUTION: A photometric device 50 includes: a light source 1; a luminance flux shaping part 20 which shapes luminous flux from the light source 1 into measurement luminous flux Lhaving a cross-sectional shape and so sectioned orthogonally to the optical axis Othat a ring-shaped vacant part is formed in a part of a ring-shaped pattern in a peripheral direction; a light shield position change part which changes the formation position of the ring-shaped vacant part; an objective 6 which converges the measurement luminous flux Lon a measured surface of a sample to be measured; an image forming optical system 9 which converges reflected luminous flux, reflected by the sample 7 to be measured, of the measurement luminous flux L; an incidence opening diaphragm 10a arranged in optically conjugate position relation with the measured surface 7a across the image forming optical system 9; a spectroscope 10 which measures luminous flux passed through the incidence opening diaphragm 10a; and an observation optical system 14 which can observe a projection image by the image forming optical system 9 through the image forming optical system 9.