MICROWAVE HEAT TREATMENT APPARATUS AND METHOD

PROBLEM TO BE SOLVED: To provide microwave heat treatment apparatus and method which allow for uniform and efficient heat treatment of a workpiece.SOLUTION: In a microwave heat treatment apparatus 1, a support device 4 comprises: a tubular shaft 14 penetrating substantially the center of the bottom...

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Bibliographic Details
Main Author YAMAMOTO NOBUHIKO
Format Patent
LanguageEnglish
Published 15.05.2014
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC HEATING
ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:PROBLEM TO BE SOLVED: To provide microwave heat treatment apparatus and method which allow for uniform and efficient heat treatment of a workpiece.SOLUTION: In a microwave heat treatment apparatus 1, a support device 4 comprises: a tubular shaft 14 penetrating substantially the center of the bottom 13 of a processing container 2 and extending to the outside of the processing container 2; a dielectric plate 15 provided near the upper end of the shaft 14 substantially in the horizontal direction; and a plurality of support pins 16 attached removably to the peripheral part of the dielectric plate 15, as a support member. The dielectric plate 15 functions as heat-assisted means for promoting the heating of a wafer W with radiation heat, by absorbing the microwaves and generating heat.
Bibliography:Application Number: JP20120238795