WASTE LIQUID TREATING SYSTEM AND WASTE LIQUID TREATING METHOD

PROBLEM TO BE SOLVED: To provide a waste liquid treating system capable of reducing the generation amount of secondary waste of high dose generated when decontamination waste liquid is treated, and provide a treating method of the decontamination waste liquid.SOLUTION: The waste liquid treating syst...

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Bibliographic Details
Main Authors NAKANO TAKASHI, FUJITA TAKAYUKI, YOSHINAGA TOMOMI, KANETOME MASATO, ONIZUKA HIRONORI
Format Patent
LanguageEnglish
Published 12.05.2014
Subjects
DECONTAMINATION ARRANGEMENTS THEREFOR
NUCLEAR ENGINEERING
NUCLEAR PHYSICS
PHYSICS
PROTECTION AGAINST X-RADIATION, GAMMA RADIATION, CORPUSCULARRADIATION OR PARTICLE BOMBARDMENT
TREATING RADIOACTIVELY CONTAMINATED MATERIAL
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Summary:PROBLEM TO BE SOLVED: To provide a waste liquid treating system capable of reducing the generation amount of secondary waste of high dose generated when decontamination waste liquid is treated, and provide a treating method of the decontamination waste liquid.SOLUTION: The waste liquid treating system 13 of the present invention includes: a first adsorption tower 32; a second adsorption tower 33; a third adsorption tower 34; a fourth adsorption tower 35; a fifth adsorption tower 36; a decontamination waste liquid circulation line L11; a first bypass line L22; and a second bypass line L23. A first resin 41 and fourth resin 42 can be buried as waste, and second resins 43A and 43B and a third resin 44 can be incinerated to be reduced in volume. Therefore, treating decontamination waste liquid 14 can reduce the generation amount of the secondary waste of high dose, which is difficult to be buried.
Bibliography:Application Number: JP20120237283