PHOTOCURABLE NANOIMPRINT COMPOSITION AND METHOD FOR FORMING PATTERN

• Main Authors: UMEKAWA HIDEKI, SATO MAKOTO
• Format: Patent
• Language: English
• Published: 10.04.2014
• Subjects: AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING; BASIC ELECTRIC ELEMENTS; CHEMISTRY; COMPOSITIONS BASED THEREON; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; PERFORMING OPERATIONS; SEMICONDUCTOR DEVICES; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR; SHAPING OR JOINING OF PLASTICS; THEIR PREPARATION OR CHEMICAL WORKING-UP; TRANSPORTING; WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL

PROBLEM TO BE SOLVED: To provide a photocurable nanoimprint composition excellent in etching resistance against chlorine-based gas, good in transferability when a mold is pressed thereon, and good in adhesion with a base material, and further to provide a photocurable nanoimprint composition good in long-term storage stability.SOLUTION: A composition for photocurable nanoimprinting includes: (A) a specific metal alkoxide; (B) an acid group-containing polymerizable monomer having a (meth)acrylic group; (C) an acid group-non-containing polymerizable monomer having a (meth)acrylic group; and (D) a photopolymerization initiator.