ACID GENERATOR COMPOUNDS AND PHOTORESISTS COMPRISING THE SAME

PROBLEM TO BE SOLVED: To provide materials that can provide highly resolved fine features, including a low linewidth roughness (LWR), and sufficient sensitivity to afford wafer throughput.SOLUTION: The photoresist composition comprises (a) polymer, and (b) an acid generator comprising (i) thioxantho...

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Main Authors JAIN VIPUL, AARON A RACHFORD, LABEAUME PAUL J
Format Patent
LanguageEnglish
Published 10.04.2014
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Abstract PROBLEM TO BE SOLVED: To provide materials that can provide highly resolved fine features, including a low linewidth roughness (LWR), and sufficient sensitivity to afford wafer throughput.SOLUTION: The photoresist composition comprises (a) polymer, and (b) an acid generator comprising (i) thioxanthone moiety and (ii) one or more covalently linked acid labile-groups.
AbstractList PROBLEM TO BE SOLVED: To provide materials that can provide highly resolved fine features, including a low linewidth roughness (LWR), and sufficient sensitivity to afford wafer throughput.SOLUTION: The photoresist composition comprises (a) polymer, and (b) an acid generator comprising (i) thioxanthone moiety and (ii) one or more covalently linked acid labile-groups.
Author LABEAUME PAUL J
JAIN VIPUL
AARON A RACHFORD
Author_xml – fullname: JAIN VIPUL
– fullname: AARON A RACHFORD
– fullname: LABEAUME PAUL J
BookMark eNrjYmDJy89L5WSwdXT2dFFwd_VzDXIM8Q9ScPb3DfAP9XMJVnD0c1EI8PAHCroGewaHBIOlgjyDPf3cFUI8XBWCHX1deRhY0xJzilN5oTQ3g5Kba4izh25qQX58anFBYnJqXmpJvFeAkYGhiYGZsaGZgaMxUYoAo-csIA
ContentType Patent
DBID EVB
DatabaseName esp@cenet
DatabaseTitleList
Database_xml – sequence: 1
  dbid: EVB
  name: esp@cenet
  url: http://worldwide.espacenet.com/singleLineSearch?locale=en_EP
  sourceTypes: Open Access Repository
DeliveryMethod fulltext_linktorsrc
Discipline Medicine
Chemistry
Sciences
Physics
ExternalDocumentID JP2014063160A
GroupedDBID EVB
ID FETCH-epo_espacenet_JP2014063160A3
IEDL.DBID EVB
IngestDate Fri Jul 19 15:36:05 EDT 2024
IsOpenAccess true
IsPeerReviewed false
IsScholarly false
Language English
LinkModel DirectLink
MergedId FETCHMERGED-epo_espacenet_JP2014063160A3
Notes Application Number: JP20130190007
OpenAccessLink https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20140410&DB=EPODOC&CC=JP&NR=2014063160A
ParticipantIDs epo_espacenet_JP2014063160A
PublicationCentury 2000
PublicationDate 20140410
PublicationDateYYYYMMDD 2014-04-10
PublicationDate_xml – month: 04
  year: 2014
  text: 20140410
  day: 10
PublicationDecade 2010
PublicationYear 2014
RelatedCompanies DOW GLOBAL TECHNOLOGIES LLC
ROHM & HAAS ELECTRONIC MATERIALS LLC
RelatedCompanies_xml – name: ROHM & HAAS ELECTRONIC MATERIALS LLC
– name: DOW GLOBAL TECHNOLOGIES LLC
Score 2.9336457
Snippet PROBLEM TO BE SOLVED: To provide materials that can provide highly resolved fine features, including a low linewidth roughness (LWR), and sufficient...
SourceID epo
SourceType Open Access Repository
SubjectTerms APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
Title ACID GENERATOR COMPOUNDS AND PHOTORESISTS COMPRISING THE SAME
URI https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20140410&DB=EPODOC&locale=&CC=JP&NR=2014063160A
hasFullText 1
inHoldings 1
isFullTextHit
isPrint
link http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV3dS8MwED_m_HrUqqhTCSJ9G7Z0tt3DkK5pbQv9oO1kb6Nr8yBCN2zFf99L1ume9hLCHYRL4HL3u9xdAJ4KtVQrozJF5J4DFG1oVjhUmlkytSg1k4ks30j3ZqNg_jLvwee2Fkb0Cf0RzRFRo0rU91bc1-v_IBYVuZXN8_IDSatXN59QuUPHvFeMqsh0OnGSmMa2bNuTIJGjdMPTNVVXrAM4RD_a4OrgvE95Wcp616a4Z3CU4HJ1ew49Vktwam-_XpPgJOxevCU4FimaZYPETg2bC8AD9CnZZJ3lcUrsOEziWUQzYkWUJF6MRCfzszwTrNTP_OiN5J5DMit0LuHRdXLbG6JEi7_9L4JkR3rtCvr1qmbXQAoV7TPijbGpmPxZdmygc4EzDVEUQ2RyA4M9C93u5Q44gOVF5zzecAf99uub3aP5bZcP4th-AS1agHQ
link.rule.ids 230,309,783,888,25576,76876
linkProvider European Patent Office
linkToHtml http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV1LS8NAEB5qfdSbRotaH4tIbsUs0TQ9BEmzqUltHiSp9FbSJAcR0mIj_n1nt6n21MuyzMAyuzA78-08FuAhpRnNe7kuXu45QFG7eo5DrupZQdNM1QuR5etrzuRpNH2eNuBzUwsj-oT-iOaIqFEZ6nsl7uvl_yMWE7mVq8f5B5IWL8PEYHKNjnmvGKrIbGDYYcACS7YsYxTKfrTmaSrVFHMP9tHH7nF1sN8HvCxluW1ThidwEOJyZXUKjaKUoGVtvl6T4MirI94SHIoUzWyFxFoNV2eAB-gyss46S4KIWIEXBhOfxcT0GQmdAIl27MZJLFiRG7v-K0kcm8SmZ5_D_dBOLKeLEs3-9j8bhVvSq21olouyuACSUrTPiDf6uqLzsGy_h84FzlREUQUik0vo7Fjoaif3DlpO4o1nY9d_68Ax5_AYClWuoVl9fRc3aIqr-a04wl9gnYNs
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=ACID+GENERATOR+COMPOUNDS+AND+PHOTORESISTS+COMPRISING+THE+SAME&rft.inventor=JAIN+VIPUL&rft.inventor=AARON+A+RACHFORD&rft.inventor=LABEAUME+PAUL+J&rft.date=2014-04-10&rft.externalDBID=A&rft.externalDocID=JP2014063160A