ACID GENERATOR COMPOUNDS AND PHOTORESISTS COMPRISING THE SAME

PROBLEM TO BE SOLVED: To provide materials that can provide highly resolved fine features, including a low linewidth roughness (LWR), and sufficient sensitivity to afford wafer throughput.SOLUTION: The photoresist composition comprises (a) polymer, and (b) an acid generator comprising (i) thioxantho...

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Bibliographic Details
Main Authors JAIN VIPUL, AARON A RACHFORD, LABEAUME PAUL J
Format Patent
LanguageEnglish
Published 10.04.2014
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PROBLEM TO BE SOLVED: To provide materials that can provide highly resolved fine features, including a low linewidth roughness (LWR), and sufficient sensitivity to afford wafer throughput.SOLUTION: The photoresist composition comprises (a) polymer, and (b) an acid generator comprising (i) thioxanthone moiety and (ii) one or more covalently linked acid labile-groups.
Bibliography:Application Number: JP20130190007