SYSTEM AND METHOD FOR TEMPERATURE CONTROL OF SEMICONDUCTOR WAFER

• Main Authors: BELENKY YURI, ITZAK YAIR, KRAUS RAFI, SAMUEL NACKASH, SHAVIT LAVY
• Format: Patent
• Language: English
• Published: 27.02.2014
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

PROBLEM TO BE SOLVED: To provide a system and a method for temperature control of a semiconductor wafer.SOLUTION: The semiconductor wafer is received in a first chamber which is in a first pressure level. A semiconductor wafer is in a first temperature and heated up to a second temperature by a first heating module. On the other hand, a pressure level in the first chamber is reduced from the first pressure level to a second pressure level. Then, the semiconductor wafer is supplied to a support element of a second chamber which maintains a third pressure level closer to the second pressure level than the first pressure level, and the support element is in a third temperature closer to the second temperature than the first temperature.