FILM DEPOSITION APPARATUS, AND TRANSPORT TRAY FOR FILM DEPOSITION APPARATUS

• Main Author: IIO ITSUSHI
• Format: Patent
• Language: English
• Published: 30.01.2014
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

PROBLEM TO BE SOLVED: To provide a film deposition apparatus that is simplified in a drive mechanism and reduces a concern for adhesion of particles to a substrate to suppress deterioration in quality of a film deposited substrate.SOLUTION: The film deposition apparatus 100 has a simple configuratio...