FILM DEPOSITION APPARATUS, AND TRANSPORT TRAY FOR FILM DEPOSITION APPARATUS

• Main Author: IIO ITSUSHI
• Format: Patent
• Language: English
• Published: 30.01.2014
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

PROBLEM TO BE SOLVED: To provide a film deposition apparatus that is simplified in a drive mechanism and reduces a concern for adhesion of particles to a substrate to suppress deterioration in quality of a film deposited substrate.SOLUTION: The film deposition apparatus 100 has a simple configuration that has a transport device 10 with a plurality of transport rollers 11 for transporting a substrate 101. The transport rollers 11 are arranged on a lower end side of the substrate 101, whereby, even if particles are generated in association with the rotation of the transport rollers 11, the possibility of adhesion of the particles to the substrate 101 that is disposed upward relative to the transport rollers 11 is lowered. The configuration includes a driven roller 12 that is rotated by coming into contact with a wall surface of a groove part 30 formed at an upper end part of a holding tool 10. A position of the holding tool is regulated from above, thereby transporting the holding tool and the substrate 101 stably and smoothly.