POLYMER COMPOSITION, PHOTORESIST COMPRISING SAID POLYMER COMPOSITION, AND COATED ARTICLE COMPRISING SAID PHOTORESIST

• Main Authors: ONGAYI OWENDI, MATTHEW D CHRISTIANSON, MATTHEW M MEYER
• Format: Patent
• Language: English
• Published: 23.01.2014
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; THEIR PREPARATION OR CHEMICAL WORKING-UP

PROBLEM TO BE SOLVED: To provide polymers with fluorinated backbones for use in extreme ultraviolet (EUV) photoresists which have improved sensitivity as well as high resolution.SOLUTION: A copolymer comprises the polymerized product of a dissolution-rate controlling monomer of the formula (I), an acyclic vinyl ether monomer of the formula (II), and a cyclic vinyl ether monomer of the formula (III). In the formulas, Ris H, F, a Calkyl, or a Cfluoroalkyl, where Ris a Cfluoroalkyl for at least one instance of the monomer of formula (I).