POLYMER COMPOSITION, PHOTORESIST COMPRISING SAID POLYMER COMPOSITION, AND COATED ARTICLE COMPRISING SAID PHOTORESIST

PROBLEM TO BE SOLVED: To provide polymers with fluorinated backbones for use in extreme ultraviolet (EUV) photoresists which have improved sensitivity as well as high resolution.SOLUTION: A copolymer comprises the polymerized product of a dissolution-rate controlling monomer of the formula (I), an a...

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Bibliographic Details
Main Authors ONGAYI OWENDI, MATTHEW D CHRISTIANSON, MATTHEW M MEYER
Format Patent
LanguageEnglish
Published 23.01.2014
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CHEMISTRY
CINEMATOGRAPHY
COMPOSITIONS BASED THEREON
ELECTROGRAPHY
HOLOGRAPHY
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS
MATERIALS THEREFOR
METALLURGY
ORGANIC MACROMOLECULAR COMPOUNDS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
THEIR PREPARATION OR CHEMICAL WORKING-UP
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Summary:PROBLEM TO BE SOLVED: To provide polymers with fluorinated backbones for use in extreme ultraviolet (EUV) photoresists which have improved sensitivity as well as high resolution.SOLUTION: A copolymer comprises the polymerized product of a dissolution-rate controlling monomer of the formula (I), an acyclic vinyl ether monomer of the formula (II), and a cyclic vinyl ether monomer of the formula (III). In the formulas, Ris H, F, a Calkyl, or a Cfluoroalkyl, where Ris a Cfluoroalkyl for at least one instance of the monomer of formula (I).
Bibliography:Application Number: JP20130120330