POLYACETAL RESIN COMPOSITION

PROBLEM TO BE SOLVED: To provide a polyacetal resin composition that can suppress generation of formaldehyde and contamination of a mold at fabrication.SOLUTION: A polyacetal resin composition includes (B) 0.05-5 parts by mass of a compound shown by the following formula (1) based on (A) 100 mass of...

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Bibliographic Details
Main Authors FUJIMOTO KUNIHIKO, NIHEI MAKOTO, NAGAI MASAYUKI, OKI YASUO, NAWATA HIDETOSHI
Format Patent
LanguageEnglish
Published 16.01.2014
Subjects
CHEMISTRY
COMPOSITIONS BASED THEREON
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
METALLURGY
ORGANIC MACROMOLECULAR COMPOUNDS
THEIR PREPARATION OR CHEMICAL WORKING-UP
USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS
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Summary:PROBLEM TO BE SOLVED: To provide a polyacetal resin composition that can suppress generation of formaldehyde and contamination of a mold at fabrication.SOLUTION: A polyacetal resin composition includes (B) 0.05-5 parts by mass of a compound shown by the following formula (1) based on (A) 100 mass of a polyacetal resin. In the formula (1), m denotes 0 or 1; n denotes a positive integer; Ris a (m+n)-valent group, and denotes a 1-40C aliphatic hydrocarbon group or the like; Ris a univalent group, and denotes a 1-40C aliphatic hydrocarbon group or the like; and Y denotes a hydrazide residue.
Bibliography:Application Number: JP20120142537