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Summary:PROBLEM TO BE SOLVED: To correct a position shift between a phase distribution measured by a wavefront sensor and a phase pattern for compensation displayed on a wavefront modulation element in a short time with high precision.SOLUTION: A method includes a first step of making a wavefront modulation element 12 display a singular point generation pattern as a pattern including a singular point at a predetermined position, a second step of measuring a wavefront shape for adjustment as a wavefront shape, obtained when a light image modulated with the singular point generation pattern is made incident on the wavefront sensor 11, by a wavefront sensor 11, a third step of detecting the position of the singular point of the wavefront shape for adjustment from a measurement result of the wavefront sensor 11, and a fourth step of adjusting a position shift between the wavefront shape measured by the wavefront sensor 11 and the pattern for compensation displayed by the wavefront modulation element 12 on the basis of a position shift of the position of the singular point detected in the third step from a predetermined position.
Bibliography:Application Number: JP20120127222