POLYSTYRENE-POLYACRYLATE BLOCK COPOLYMER, METHOD OF MANUFACTURE THEREOF, AND ARTICLE COMPRISING THE SAME

PROBLEM TO BE SOLVED: To provide self-assembled films having domain sizes of less than 20 nm with a periodicity of less than 20 nm by a block copolymer.SOLUTION: A block copolymer comprises a first block derived from a vinyl aromatic monomer; and a second block derived from an acrylate monomer; wher...

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Bibliographic Details
Main Authors PETER TREFONAS III, HILLMYER MARC ANDREW, BATES FRANK STEVEN, HUSTAD PHILLIP DENE, KENNEMUR JUSTIN GLENN
Format Patent
LanguageEnglish
Published 05.12.2013
Subjects
CHEMISTRY
COMPOSITIONS BASED THEREON
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS
METALLURGY
ORGANIC MACROMOLECULAR COMPOUNDS
THEIR PREPARATION OR CHEMICAL WORKING-UP
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Summary:PROBLEM TO BE SOLVED: To provide self-assembled films having domain sizes of less than 20 nm with a periodicity of less than 20 nm by a block copolymer.SOLUTION: A block copolymer comprises a first block derived from a vinyl aromatic monomer; and a second block derived from an acrylate monomer; where a chi parameter that measures interactions between the first block and the second block is greater than or equal to about 0.05, when measured at 240°C. A vinyl aromatic monomer is anionically polymerized to form a first block; and a second block is anionically polymerized onto the first block to form a block copolymer through sequential living polymerization.
Bibliography:Application Number: JP20130097484