LIQUID PROCESSING DEVICE, LIQUID PROCESSING METHOD AND STORAGE MEDIUM

• Main Authors: ANDO RYOJI, SATO TAKAZO
• Format: Patent
• Language: English
• Published: 07.11.2013
• Subjects: APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; MEASURING; MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUIDLEVEL; METERING BY VOLUME; PERFORMING OPERATIONS; PHYSICS; SEMICONDUCTOR DEVICES; SPRAYING OR ATOMISING IN GENERAL; TESTING; TRANSPORTING

PROBLEM TO BE SOLVED: To provide a liquid processing device which can measure a flow rate of a processing liquid with high accuracy and monitor a discharge state of the processing liquid when processing a substrate with the processing liquid.SOLUTION: A liquid processing device includes a processing liquid supply source and a passage member. The passage member includes thereon an ultrasonic wave flowmeter and a liquid feeding mechanism for feeding a processing liquid to a nozzle. The ultrasonic wave flowmeter includes a pair of piezoelectric elements 42a, 42b in a circumferential direction of a tube 41 and measures a flow rate of the processing liquid equal to or less than 1 mL/sec in the tube 41 on the basis of the time from ultrasonic wave oscillation to detection by bi-directionally executing oscillation of the ultrasonic wave by one piezoelectric element and detection of the oscillated ultrasonic wave by the other piezoelectric element. The liquid processing device is configured to be able to monitor bubbles in the processing liquid, a discharge state of the processing liquid and the like on the basis of change in waveform of the flow rate observed by the flowmeter.