THERMAL REACTOR WITH IMPROVED GAS FLOW DISTRIBUTION

PROBLEM TO BE SOLVED: To provide an apparatus and method for improving gas distribution during thermal processing.SOLUTION: An apparatus comprises: sidewalls with an inlet port 243 and an outlet port 234 formed through the sidewalls on opposite sides of a center volume; a top wall coupled to an uppe...

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Main Authors TSENG MING-KUEI (MICHAEL), ALEXANDER N LERNER, MEHRAN BEHDJAT, NORMAN TAM, SUNDAR RAMAMURTHY, YOKOTA YOSHITAKA, ROBERT NAVASCA, KEDARNATH SANGAM, AGUS TJANDRA
Format Patent
LanguageEnglish
Published 24.10.2013
Subjects
BASIC ELECTRIC ELEMENTS
BLASTING
DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS,IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KINDOF FURNACE
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
FURNACES
HEATING
KILNS
LIGHTING
MECHANICAL ENGINEERING
OVENS
RETORTS
SEMICONDUCTOR DEVICES
WEAPONS
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Summary:PROBLEM TO BE SOLVED: To provide an apparatus and method for improving gas distribution during thermal processing.SOLUTION: An apparatus comprises: sidewalls with an inlet port 243 and an outlet port 234 formed through the sidewalls on opposite sides of a center volume; a top wall coupled to an upper end of the sidewalls; a bottom wall coupled a lower end of the sidewalls; a substrate support 238 disposed in the center volume; an injection assembly 247 coupled to the sidewalls at the inlet port; and an exhaust assembly coupled to the sidewalls at the outlet port. The exhaust assembly comprises: a body defining an exhaust volume 225; and an exhaust port formed through the body so as to be connected with a pump system 236. The exhaust volume extends by a distance between the inlet port and the exhaust port in the direction from the inlet port to the outlet port.
Bibliography:Application Number: JP20130049126