METHOD OF MANUFACTURING CHEMICAL MECHANICAL POLISHING LAYERS HAVING WINDOW

• Main Authors: BRIAN CANTRELL, KATHLEEN MCHUGH, JAMES MURNANE, CHRISTOPHER A YOUNG, ROBERT A BRADY, JEFFREY BORCHERDT MILLER, GEORGE MCCLAIN, DURRON HUTT
• Format: Patent
• Language: English
• Published: 30.09.2013
• Subjects: BASIC ELECTRIC ELEMENTS; DRESSING OR CONDITIONING OF ABRADING SURFACES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS; GRINDING; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; PERFORMING OPERATIONS; POLISHING; SEMICONDUCTOR DEVICES; TRANSPORTING

PROBLEM TO BE SOLVED: To provide a method of manufacturing polishing layers having a window for use in chemical mechanical polishing pads, where polishing layers having an integral window are derived and the formation of density defects in a cake and the surface roughness of the polishing layers are minimized.SOLUTION: The method comprises: providing a mold, having a mold base and a surrounding wall; providing a liner; providing a liner adhesive; providing a window block; providing a window adhesive; providing a curable material; providing a nozzle; providing a skiver blade; providing a strop; providing a stropping compound; bonding a bottom surface of the liner to the mold base; bonding the window block to a top surface of the liner; charging the curable material to the mold cavity ; allowing the curable material to cure; separating the surrounding wall; applying the stropping compound to a cutting edge; stropping the skiver blade with the strop; and slicing a cake into multiple polishing layers.