MANUFACTURING METHOD OF AE SENSOR AND AE SENSOR MANUFACTURED BY THE METHOD

PROBLEM TO BE SOLVED: To provide a manufacturing method of an AE sensor, which allows an objective cantilever or both ends fixed beam shape (cross-sectional shape) to be accurately made.SOLUTION: A manufacturing method of an AE sensor 10 allows a plurality of cantilevers 1 to be made in array on a s...

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Bibliographic Details
Main Authors MUTO KAZUO, KAWASHIMA TAKAHIRO, SHIBATA TAKAYUKI, NAGAI MOETO
Format Patent
LanguageEnglish
Published 26.09.2013
Subjects
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
PHYSICS
TESTING
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Summary:PROBLEM TO BE SOLVED: To provide a manufacturing method of an AE sensor, which allows an objective cantilever or both ends fixed beam shape (cross-sectional shape) to be accurately made.SOLUTION: A manufacturing method of an AE sensor 10 allows a plurality of cantilevers 1 to be made in array on a silicon substrate 4 of SOI(Silicon on Insulator), so that the silicon thickness of a device layer remains intact as the uniform thickness of the cantilevers 1. Due to the transfer accuracy in dry etching technique, a cantilever or both ends fixed beam shape (cross-sectional shape) can be relatively accurately made.
Bibliography:Application Number: JP20120057883