EXPOSURE DEVICE, PROJECTION OPTICAL SYSTEM, AND DEVICE MANUFACTURING METHOD

• Main Author: FUKAMI SEIJI
• Format: Patent
• Language: English
• Published: 12.09.2013
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

PROBLEM TO BE SOLVED: To provide a technique advantageous for constituting a projection optical system projecting a pattern of a mask on a substrate.SOLUTION: An exposure device has a projection optical system forming an arc-like illumination region and projecting a pattern of a mask on a substrate. The projection optical system includes a first optical system having a first concave mirror including a first reflection face and a first rear face, and a second optical system having a second concave mirror including a second reflection face and a second rear face. The first concave mirror and the second concave mirror are arranged so that the first rear face and the second rear face are opposed to each other in a first direction from an object face of the projection optical system toward an image face of the projection optical system. The first optical system is constituted so that an imaging face of the object face of the projection optical system is formed at a position outside the first concave mirror in a second direction orthogonal to the first direction and between the first rear face and the second rear face in the first direction. The second optical system is constituted so that the image face of the projection optical system is formed with the imaging face as the object face of the second optical system.