COATING COMPOSITION FOR USE TOGETHER WITH PHOTORESIST TO BE OVER-COATED

• Main Authors: WAYTON GERALD B, ZAMPINI ANTHONY
• Format: Patent
• Language: English
• Published: 29.08.2013
• Subjects: ADHESIVES; APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CHEMICAL PAINT OR INK REMOVERS; CHEMISTRY; CINEMATOGRAPHY; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS; CORRECTING FLUIDS; DYES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; FILLING PASTES; HOLOGRAPHY; INKS; MATERIALS THEREFOR; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; ORIGINALS THEREFOR; PAINTS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; POLISHES; SEMICONDUCTOR DEVICES; USE OF MATERIALS THEREFOR; WOODSTAINS

PROBLEM TO BE SOLVED: To provide an organic coating composition comprising an antireflective coating composition that can reduce reflection of irradiation radiation from a base substance back into an over-coated photoresist layer and/or function as planarizing or via-fill layer.SOLUTION: A preferred organic coating composition of the invention comprises one or more kinds of resin that can harden by thermal treatment without generation of a fission product. A particularly preferred organic coating composition of the invention comprises one or more kinds of components that comprise anhydride and hydroxyl moieties.