COATING COMPOSITION FOR USE TOGETHER WITH PHOTORESIST TO BE OVER-COATED

PROBLEM TO BE SOLVED: To provide an organic coating composition comprising an antireflective coating composition that can reduce reflection of irradiation radiation from a base substance back into an over-coated photoresist layer and/or function as planarizing or via-fill layer.SOLUTION: A preferred...

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Bibliographic Details
Main Authors WAYTON GERALD B, ZAMPINI ANTHONY
Format Patent
LanguageEnglish
Published 29.08.2013
Subjects
ADHESIVES
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CHEMICAL PAINT OR INK REMOVERS
CHEMISTRY
CINEMATOGRAPHY
COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS
CORRECTING FLUIDS
DYES
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
FILLING PASTES
HOLOGRAPHY
INKS
MATERIALS THEREFOR
METALLURGY
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
ORIGINALS THEREFOR
PAINTS
PASTES OR SOLIDS FOR COLOURING OR PRINTING
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
POLISHES
SEMICONDUCTOR DEVICES
USE OF MATERIALS THEREFOR
WOODSTAINS
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Summary:PROBLEM TO BE SOLVED: To provide an organic coating composition comprising an antireflective coating composition that can reduce reflection of irradiation radiation from a base substance back into an over-coated photoresist layer and/or function as planarizing or via-fill layer.SOLUTION: A preferred organic coating composition of the invention comprises one or more kinds of resin that can harden by thermal treatment without generation of a fission product. A particularly preferred organic coating composition of the invention comprises one or more kinds of components that comprise anhydride and hydroxyl moieties.
Bibliography:Application Number: JP20130096761