CAISSON METHOD AND CAISSON TO BE USED FOR THE SAME METHOD

PROBLEM TO BE SOLVED: To provide a caisson method for reducing a frictional force to be generated between the outer peripheral surface of a caisson and the peripheral ground, and for smoothly installing the caisson to a predetermined depth in the ground without changing the condition of the peripher...

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Main Authors HAYASHI NAOTAKA, NAKAMURA TETSUYOSHI, KANAI DAISUKE, AMANO HIROSHI, HATTORI AKIRA, OKAMOTO KOICHI, OKADA NAO
Format Patent
LanguageEnglish
Published 29.08.2013
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Summary:PROBLEM TO BE SOLVED: To provide a caisson method for reducing a frictional force to be generated between the outer peripheral surface of a caisson and the peripheral ground, and for smoothly installing the caisson to a predetermined depth in the ground without changing the condition of the peripheral ground around the caisson.SOLUTION: The caisson method includes: an application process of applying base materials 16 for friction reduction to an outer peripheral surface 15 of a caisson 10 (split construction units: first lot 12a to sixth lot 12f) on the ground; and a sedimentation process of making the caisson 10 gradually sediment in the ground 28 by pressure air drilling under the caisson bottom face after the base materials 16 for friction reduction applied by the application process are dried. In the sedimentation process, the caisson 10 is made to sediment in the ground while reducing friction between the outer peripheral surface 15 of the caisson 10 and the peripheral ground by using the base materials 16 for friction reduction.
Bibliography:Application Number: JP20120029045