SYSTEM FOR ATTACHMENT OF ELECTRODE INTO INDUCTIVELY COUPLED PLASMA SOURCE

• Main Authors: ZHANG SHOUYIN, SCHWIND GREGORY A, SMITH NOEL, KELLOGG SEAN, GRAUPERA ANTHONY, UTLAUT MARK W, PARKER N WILLIAM, WALTER SKOCZYLAS, WELLS ANDREW B
• Format: Patent
• Language: English
• Published: 11.07.2013
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS

PROBLEM TO BE SOLVED: To provide a system for removable attachment of an electrode onto an inductively coupled plasma ion source for use in a focused ion beam system.SOLUTION: An inductively coupled plasma charged particle source 200 for focused ion beam systems includes a plasma reaction chamber with a removably attached source electrode 206. A fastening mechanism connects the source electrode with the plasma reaction chamber and allows a heat-conductive vacuum seal to form. The use of the removable source electrode can improve serviceability of a plasma source tube and enables reuse of the plasma source tube.