SYSTEM FOR ATTACHMENT OF ELECTRODE INTO INDUCTIVELY COUPLED PLASMA SOURCE

PROBLEM TO BE SOLVED: To provide a system for removable attachment of an electrode onto an inductively coupled plasma ion source for use in a focused ion beam system.SOLUTION: An inductively coupled plasma charged particle source 200 for focused ion beam systems includes a plasma reaction chamber wi...

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Bibliographic Details
Main Authors ZHANG SHOUYIN, SCHWIND GREGORY A, SMITH NOEL, KELLOGG SEAN, GRAUPERA ANTHONY, UTLAUT MARK W, PARKER N WILLIAM, WALTER SKOCZYLAS, WELLS ANDREW B
Format Patent
LanguageEnglish
Published 11.07.2013
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PLASMA TECHNIQUE
PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS
PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
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Summary:PROBLEM TO BE SOLVED: To provide a system for removable attachment of an electrode onto an inductively coupled plasma ion source for use in a focused ion beam system.SOLUTION: An inductively coupled plasma charged particle source 200 for focused ion beam systems includes a plasma reaction chamber with a removably attached source electrode 206. A fastening mechanism connects the source electrode with the plasma reaction chamber and allows a heat-conductive vacuum seal to form. The use of the removable source electrode can improve serviceability of a plasma source tube and enables reuse of the plasma source tube.
Bibliography:Application Number: JP20120256984