ETCHING PROCESSING METHOD FOR METAL SURFACE

• Main Authors: TSUKAHARA CHISATO, SHUTO SHINGO, SHIRANE TAKAHIRO, ONISHI TOSHIYUKI
• Format: Patent
• Language: English
• Published: 08.07.2013
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES; MEASURING; METALLURGY; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25; NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; PHYSICS; TESTING

PROBLEM TO BE SOLVED: To provide a metal surface etching processing method by which only a portion required to be confirmed can be surely observed.SOLUTION: Etching liquid-containing filter paper 13 to be a base material containing an etching liquid is stuck to an observation surface 12 of a metal test piece 11, and while rolling a roller 14 along the surface of the stuck etching liquid-containing filter paper 13, the etching liquid is uniformly applied to the observation surface 12 to form an etching observation surface. Consequently, only a portion required to be confirmed can be surely etched.