EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, AND EXPOSURE DEVICE
PROBLEM TO BE SOLVED: To achieve high throughput.SOLUTION: An exposure device EX includes: an illumination system IS and a projection system PS that transfer a pattern including an alignment mark on a substrate P; a substrate stage 2 that moves the substrate P in a scanning direction while holding t...
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Main Authors | , , |
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Format | Patent |
Language | English |
Published |
04.07.2013
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Subjects | |
Online Access | Get full text |
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