SUPPORT, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To provide a support in which measures are taken to reduce bending of a substrate during loading.SOLUTION: A support for an object has a support surface configured to support the object. The support surface includes a main part and a moveable part. The moveable part of the supp...

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Bibliographic Details
Main Authors SIJBEN ANKO JOZEF CORNELUS, GILISSEN NOUD JAN, SMEETS MARTIN FRANCE PIERRE, MARTINUS AGNES WILLEM CUIJPERS, FIEN MENNO
Format Patent
LanguageEnglish
Published 13.06.2013
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PROBLEM TO BE SOLVED: To provide a support in which measures are taken to reduce bending of a substrate during loading.SOLUTION: A support for an object has a support surface configured to support the object. The support surface includes a main part and a moveable part. The moveable part of the support surface is moveable between a retracted position and an extended position. In the retracted position, the moveable part of the support surface is substantially in the same plane as the main part of the support surface. In the extended position, the moveable part of the support surface protrudes from the plane of the main part of the support surface.
Bibliography:Application Number: JP20120239420