ELECTRON SPIN POLARIZATION ION BEAM GENERATION METHOD AND GENERATION DEVICE THEREFOR

• Main Authors: SUZUKI HIROSHI, YAMAUCHI YASUSHI, HISHIDA SHUNICHI
• Format: Patent
• Language: English
• Published: 07.02.2013
• Subjects: GAMMA RAY OR X-RAY MICROSCOPES; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES; IRRADIATION DEVICES; MEASURING; NUCLEAR ENGINEERING; NUCLEAR PHYSICS; PHYSICS; TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR; TESTING

PROBLEM TO BE SOLVED: To provide an electron spin polarization ion beam generation method which does not use an optical pumping method, and the absolute value of spin polarization rate of which is 0.05 or larger, and a generation device therefor.SOLUTION: There is provided the electron spin polarization ion beam generation method including the processes of: generating an ion beam comprising rare gas element ions; making the ion beam incident on one surface 12a of a target 12 and emitting a scattered ion beam; and taking the scattered ion beam into an electrostatic analyzer 13, and applying an electric field to generate an electron spin polarization ion beam. When the ion beam is made incident on the one surface 12a of the target 12, a magnetic field is applied at an angle of 80° or greater and 100° or less to a scattering plane containing both the incidence direction of the ion beam and the projection direction of the scattered ion beam.