INTERFERENCE ALIGNER

PROBLEM TO BE SOLVED: To provide an interference aligner capable of forming various patterns easily at a low cost.SOLUTION: The interference aligner includes an optical path changing section where elements for changing the optical path direction and the optical path length of a plurality of light be...

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Bibliographic Details
Main Authors KODERA KATSUMASA, TANAKA SATOSHI
Format Patent
LanguageEnglish
Published 04.02.2013
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PROBLEM TO BE SOLVED: To provide an interference aligner capable of forming various patterns easily at a low cost.SOLUTION: The interference aligner includes an optical path changing section where elements for changing the optical path direction and the optical path length of a plurality of light beams are arranged substantially in axial symmetry for light beams that may interfere with each other, and an adjustment section which adjusts a portion of a light beam impinging on a substrate by changing the intensity or the phase of a portion of the light beam corresponding to the shape of a pattern formed on the substrate. Interference exposure onto the substrate is performed by causing interference of light beams emitted from the optical path changing section and the adjustment section.
Bibliography:Application Number: JP20110156965