RADIATION SOURCE AND LITHOGRAPHIC APPARATUS

PROBLEM TO BE SOLVED: To provide more uniform EUV radiation.SOLUTION: A radiation source configured to generate EUV radiation comprises: a fuel droplet generator configured to deliver a fuel droplet to an interaction point; an optical system configured to deliver fuel vaporizing and exciting radiati...

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Bibliographic Details
Main Authors LOOPSTRA ERIK ROELOF, BANINE VADIM YEVGENYEVICH, SWINKELS GERARDUS HUBERTUS PETRUS MARIA, ERIK PETRUS BUEHLMANN
Format Patent
LanguageEnglish
Published 10.01.2013
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
X-RAY TECHNIQUE
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Summary:PROBLEM TO BE SOLVED: To provide more uniform EUV radiation.SOLUTION: A radiation source configured to generate EUV radiation comprises: a fuel droplet generator configured to deliver a fuel droplet to an interaction point; an optical system configured to deliver fuel vaporizing and exciting radiation to the interaction point to generate plasma; and a collector arranged to collect the EUV radiation emitted by the plasma. The optical system is configured such that in use the fuel vaporizing and the exciting radiation are entered upon more than one side of the fuel droplet at the interaction point.
Bibliography:Application Number: JP20120177503