RADIATION SOURCE AND LITHOGRAPHIC APPARATUS
PROBLEM TO BE SOLVED: To provide more uniform EUV radiation.SOLUTION: A radiation source configured to generate EUV radiation comprises: a fuel droplet generator configured to deliver a fuel droplet to an interaction point; an optical system configured to deliver fuel vaporizing and exciting radiati...
Saved in:
Main Authors | , , , |
---|---|
Format | Patent |
Language | English |
Published |
10.01.2013
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | PROBLEM TO BE SOLVED: To provide more uniform EUV radiation.SOLUTION: A radiation source configured to generate EUV radiation comprises: a fuel droplet generator configured to deliver a fuel droplet to an interaction point; an optical system configured to deliver fuel vaporizing and exciting radiation to the interaction point to generate plasma; and a collector arranged to collect the EUV radiation emitted by the plasma. The optical system is configured such that in use the fuel vaporizing and the exciting radiation are entered upon more than one side of the fuel droplet at the interaction point. |
---|---|
Bibliography: | Application Number: JP20120177503 |