PHASE DIFFERENCE ELEMENT AND MANUFACTURING METHOD FOR THE SAME

• Main Authors: SASAKI MASATOSHI, TAKADA AKIO, YAMADA TAKATOSHI, HANASHIMA NAOKI, KOIKE NOBUYUKI
• Format: Patent
• Language: English
• Published: 10.12.2012
• Subjects: ACCESSORIES THEREFOR; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES; APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM; CINEMATOGRAPHY; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING; ELECTROGRAPHY; FREQUENCY-CHANGING; HOLOGRAPHY; NON-LINEAR OPTICS; OPTICAL ANALOGUE/DIGITAL CONVERTERS; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICAL LOGIC ELEMENTS; OPTICS; PHOTOGRAPHY; PHYSICS; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF

PROBLEM TO BE SOLVED: To provide a phase difference element that can reduce the reflection of incident light, and a manufacturing method for the same.SOLUTION: A phase difference element includes: a transparent substrate 11; an interface reflection prevention film 12 on the transparent substrate 11, in which a high-refractive-index film and a low-refractive-index film are alternately stacked and the thickness of each layer is less than or equal to the used wavelength; and an oblique deposition film 13 on the interface reflection prevention film 12, in which dielectric materials are alternately deposited obliquely in two directions that are different by 180°. The refractive index of the interface reflection prevention film 12 is higher than that of the transparent substrate 11 and lower than that of the oblique deposition film 13.