SEMICONDUCTOR EXPOSURE DEVICE USING EXTREME ULTRA VIOLET LIGHT

• Main Authors: WAKABAYASHI OSAMU, GEORGE SOUMAGNE, MORIYA MASATO
• Format: Patent
• Language: English
• Published: 08.11.2012
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; X-RAY TECHNIQUE

PROBLEM TO BE SOLVED: To provide an exposure device capable of supplying only EUV light to a mask, while eliminating another light other than the EUV light.SOLUTION: A multilayer film of Mo/Si is formed on a front surface of a mirror 510, and blazed grooves 513 are formed on the multilayer film. Lig...