METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
PROBLEM TO BE SOLVED: To provide a method for manufacturing a semiconductor device capable of improving the nonuniformity of transistor characteristics in a substrate.SOLUTION: A method comprises a step for performing an ion implantation S/D IMP for forming a source/drain junction of a transistor in...
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Main Authors | , , , |
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Format | Patent |
Language | English |
Published |
01.11.2012
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Subjects | |
Online Access | Get full text |
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