LITHOGRAPHIC APPARATUS AND METHOD

• Main Authors: YAN-SHAN HUANG, ACKERMANS JOHANNES ANTONIUS GERARDUS, MARINUS MARIA JOHANNES VAN DE WAL, VERMEULEN JOHANNES PETRUS MARTINUS, CATHARINA MARIA BEERENS RUUD ANTONIUS, ANGENENT WILHELMUS HENRICUS THEODORUS MARIA
• Format: Patent
• Language: English
• Published: 01.11.2012
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

PROBLEM TO BE SOLVED: To provide a lithographic apparatus with a deformation sensor which uses low volume and is cost effective, or an alternative deformation sensor.SOLUTION: A lithographic apparatus includes: an illumination system configured to adjust a radiation beam; a support medium constructed to support a patterning device capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and a deformation sensor to determine deformations of an object of the lithographic apparatus. The deformation sensor includes at least one optical fiber arranged on or in the object, the optical fiber including one or more Bragg gratings, and an interrogation system to interrogate the one or more Bragg gratings.