SAMPLE PREPARATION DEVICE AND METHOD

PROBLEM TO BE SOLVED: To realize an ion beam etching device which improves economical efficiency of sample preparation by reducing the number of sample replacements and improving the operation rate of the ion beam etching device.SOLUTION: A sample table 100 includes reception mechanisms 106 to which...

Full description

Saved in:
Bibliographic Details
Main Authors PLANK HEINZ, PFEIFFER THOMAS
Format Patent
LanguageEnglish
Published 06.09.2012
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
Online AccessGet full text

Cover

More Information
Summary:PROBLEM TO BE SOLVED: To realize an ion beam etching device which improves economical efficiency of sample preparation by reducing the number of sample replacements and improving the operation rate of the ion beam etching device.SOLUTION: A sample table 100 includes reception mechanisms 106 to which samples 104 are attached, masks 105, and at least one positioning unit 101, 102, 103. The sample 104 may be positioned relative to the mask 105. While one sample 104 is subject to the ion beam, the sample table 100 places the other positioning units 101, 102, 103 so as to avoid the ion beam. Further, the samples 104 are sequentially subject to etching process by a rotation mechanism.
Bibliography:Application Number: JP20120024872