LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To reduce image distortion due to temperature gradients in a substrate and immersion liquid in an immersion projection exposure apparatus.SOLUTION: An immersion lithography apparatus comprises a temperature controller configured to adjust temperature of a member in the final st...

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Bibliographic Details
Main Authors STRAAIJER ALEXANDER, ANTONIUS THEODORUS ANNA MARIA DERKSEN, STREEFKERK BOB, JOERI LOF, SIMON KLAUS
Format Patent
LanguageEnglish
Published 09.08.2012
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PROBLEM TO BE SOLVED: To reduce image distortion due to temperature gradients in a substrate and immersion liquid in an immersion projection exposure apparatus.SOLUTION: An immersion lithography apparatus comprises a temperature controller configured to adjust temperature of a member in the final stage of a projection exposure apparatus PL, a substrate, and immersion liquid to common target temperature T4. Imaging consistency and whole performance can be improved, by adjusting all of the temperatures of these structural members and by reducing temperature gradients. Means used to adjust the temperature may include controlling a flow rate and the temperature of the immersion liquid via a feedback circuit.
Bibliography:Application Number: JP20120061787