RADICAL MEASUREMENT APPARATUS AND RADICAL MEASUREMENT PIPE

• Main Authors: INAYOSHI SAKAE, OGATA SEIJI, ISHIGURE FUMIAKI, GONDO MAIKO, MIURA YUTAKA
• Format: Patent
• Language: English
• Published: 17.05.2012
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS; SEMICONDUCTOR DEVICES

PROBLEM TO BE SOLVED: To provide a radical measurement apparatus and a radical measurement pipe including a sample pipe formed by the combination of flat plate-shaped sample materials.SOLUTION: A radical measurement apparatus 1 of the present invention comprises: a radical generating chamber 2; a measurement pipe 4; a supporting body 16; and a vacuum evacuating part 10. The radical generating chamber 2 includes radical generating means 6 for generating a radical of a material gas by generating plasma of the material gas. The measurement pipe 4 communicates with the radical generating chamber 2. The supporting body 16 is arranged in the measurement pipe 4, and supports each sample plate so that a tube-shaped sample pipe is formed by a sample plate S formed of a plurality of flat plate-shaped sample materials. The vacuum evacuating part 10 evacuates the measurement pipe 4. A temperature sensor 9 is inserted through the sample pipe and can move along the axial direction of the sample pipe.