POLISHING APPARATUS
PROBLEM TO BE SOLVED: To allow the size and cost of a polishing apparatus to be reduced, and to prevent a shock caused by control switching from occurring.SOLUTION: A rotation speed deviation calculating part 230 calculates a rotation speed deviation by subtracting the rotation speed of a polishing...
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Main Authors | , , |
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Format | Patent |
Language | English |
Published |
08.03.2012
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Subjects | |
Online Access | Get full text |
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Summary: | PROBLEM TO BE SOLVED: To allow the size and cost of a polishing apparatus to be reduced, and to prevent a shock caused by control switching from occurring.SOLUTION: A rotation speed deviation calculating part 230 calculates a rotation speed deviation by subtracting the rotation speed of a polishing tool 11 from a target rotation speed. A control correction amount calculating part 240 calculates a control correction amount for integral control of force application onto the polishing tool 11 of a travel driving part 15 on the basis of the rotation speed deviation. A general target position calculating part 320 calculates a general target position by subtracting a control correction amount from a target position. A general position deviation calculating part 330 calculates a general position deviation by subtracting an actual position from the general target position. A position control part 340 calculates a control command value for PID control on the basis of the general position deviation, and outputs it to the travel driving part 15. |
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Bibliography: | Application Number: JP20110005886 |