METHOD OF MANUFACTURING TFT USING PHOTOSENSITIVE APPLICATION-TYPE ELECTRODE MATERIAL

• Main Authors: SUGINOYA MITSURU, ISHIZONE NOBORU, KOBAYASHI HIROMASA
• Format: Patent
• Language: English
• Published: 02.02.2012
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

PROBLEM TO BE SOLVED: To provide a method for manufacturing TFTs capable of solving problems concerning the simplification of the process, material use efficiency, costs and responses to various substrate sizes, which cannot be solved with traditional methods of manufacturing electrodes such as photolithography and mask sputtering, and capable of obtaining a pattern with high definition even in the ink jet method.SOLUTION: A desired electrode pattern is made with photosensitive application-type electrode materials. In this electrode manufacturing process, the desired electrode pattern can be obtained by applying a first light exposure with the use of a lamp whose source is cost-effective diffusion light, and then applying a second light exposure with larger amount of light than the first light exposure. This process of using two exposures with diffusion light achieves the material use efficiency, costs, responses to various substrate sizes and high-definition electrode patterning that is not successful in the ink jet method, for instance, in manufacturing TFTs, which the traditional manufacturing method cannot achieve.