SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

PROBLEM TO BE SOLVED: To provide a semiconductor device having excellent characteristics and achieving microfabrication, and to provide a method of manufacturing the same.SOLUTION: The semiconductor device comprises: a columnar silicon layer 208 on a planar silicon layer 212; a first ntype silicon l...

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Bibliographic Details
Main Authors CHEN ZI CHAN, ARAI SHINTARO, NAKAMURA HIROKI, SHEN NANSHENG, VLADIMIR BLIZNETSOV, KUDO TOMOHIKO, NAWAB SINGH, KABISA DEVI BUDDHARAJU, CHUI KIM JIN, SHAN LEE, MASUOKA FUJIO, JAN YU, ISO LEE
Format Patent
LanguageEnglish
Published 22.12.2011
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